DISEÑO Y MODELADO 3D DE UN REACTOR CVD PARA EL DESARROLLO DE MATERIALES SEMICONDUCTORES
DISEÑO Y MODELADO 3D DE UN REACTOR CVD PARA EL DESARROLLO DE MATERIALES SEMICONDUCTORES
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DOI: https://doi.org/10.22533/at.ed.3161225080415
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Palavras-chave: Modelado 3D, SolidWorks, CAD, diseño de reactor
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Keywords: 3D modeling, SolidWorks, CAD, reactor design.
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Abstract: This work focuses on the three-dimensional (3D) design of a chemical vapor deposition (CVD) reactor, focusing specifically on the computational modeling and simulation stage using SolidWorks, one of the most robust computer-aided design (CAD) tools in the engineering field. This design was conceived with the purpose of developing a functional, adaptable, and low-cost experimental system for the synthesis of semiconductor materials, mainly in academic or emerging research contexts. Through SolidWorks, a detailed model of the reactor was generated, including key components such as the reaction chamber, the resistive heating system, the gas inlets, and the substrate support. The virtual construction allowed assembly simulations and mechanical interference analyses, which optimized the internal space of the reactor, reduced thermal losses, and guaranteed a uniform distribution of reactive gases. Furthermore, the CAD environment facilitated the evaluation of different geometric configurations without incurring additional manufacturing costs, accelerating the design iteration process. The use of SolidWorks also enabled the generation of technical drawings and exploded views that facilitated the manufacturing process and system assembly. This design methodology prior to the physical development of the reactor represents a key tool in the implementation of emerging technologies, as it minimizes risks, improves the precision of the final assembly, and allows for the rigorous documentation of each system component. In this sense, 3D modeling not only served as a means of visualization but also as a critical stage of technical and functional validation.
- Ángel O. Paredes Balan
- Germán Escalante
- Mauricio I. Huchin Miss
- Enrique Escalante-Notario
- Antonio Coyopol
- Roberto C. Canto Canul
- Ana María Zunza Carenzo